Equipment Statistics
The μMLA is a direct write photolithography tool that can expose substrates without the need for a mask. The tool has two exposure sources, a 365 nm LED and a 375 nm Laser. As well, the system provide two focus modes, pneumatic and optical where the optical mode will provide more precision but requires more time for the system to perform a write. The system provides two writing modes. The first being the Raster Scan mode which is your typical write mode. The second is the Vector mode which allows for smooth continuous curves within a design. This device has the capability of exposing down to 600 nm structures.