Equipment Statistics
The VOYAGER is a dedicated electron beam lithography system and can be used to pattern high-resolution structures in the nanometer range, form complex masks of up to 7-inch diameter and wafers of up to 8-inch diameter by using direct-write procedures, create multi-layered patterning designs using the GDSII Editor, whereby individual doses can be assigned to single elements. The instrument features include up to 50 kV accelerating voltage for a larger process window, 500 µm write field size with sub-8nm features, 20-bit pattern generator for <0.5 nm resolution at full write field 500 by 500 µm2, unique writing modes such as Traxx (FBMS-Fixed Beam Moving Stage) and Periodixx (MBMS-moving Beam Moving Stage) with auto-focus/auto-stigmator/auto stage adjustment for enabling stitching-error-free patterns.